Sisley-ParisGentle Facial Buffing Cream, 1.6 oz.
$115
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Gentle Facial Buffing Cream absorbs sebum and impurities while lifting and removing dead skin cells with delicate, exfoliating microparticles. With an extract of German Chamomile, known for its soothing and softening benefits, this cream gently exfoliates the epidermis to enhance the skins receptiveness to skin care products. Skin appears polished and softened, ideal for preparing the complexion for a mask or self tanner.
Results:
The complexion is luminous, the skin's texture appears polished and is more receptive to skin care products.
Key Ingredients:
Apply a thin layer to clean, dry skin of the face and neck (avoiding the eye contour). Allow to dry for one to two minutes, then using a circular motion, gently massage skin until all of the gentle exfoliating particles have disappeared. Rinse thoroughly with water and apply an appropriate lotion for your skin type. May be used once or twice per week.
Ingredients: Aqua/water/eau, glycerin, hydrogenated polyisobutene, cetyl palmitate, bis-diglyceryl polyacyladipate-2, peg-6 stearate, isopropyl palmitate, peg-32 stearate, butylene glycol, echinacea angustifolia extract, malva sylvestris (mallow) flower extract, soluble collagen, stearyl alcohol, dimethicone, carbomer, disodium edta, sodium hydroxide, citric acid, sodium citrate, parfum/fragrance, phenoxyethanol, sorbic acid, sodium benzoate, alpha-isomethyl ionone, benzyl salicylate, benzyl benzoate, citronellol, linalool, amyl cinnamal, cinnamyl alcohol, eugenol, coumarin, limonene, isoeugenol, hydroxycitronellal, benzyl alcohol
Disclaimer: Please note that the ingredient list in the composition of Sisley and Hair Rituel by Sisley-Paris may change or vary over time. Please refer to the product packaging you receive before using for the most up-to-date ingredient list.
1.6 oz./ 50 mL
Results:
The complexion is luminous, the skin's texture appears polished and is more receptive to skin care products.
Key Ingredients:
- German Chamomile: softens, soothes
- Kaolin
- Exfoliating microparticles
Apply a thin layer to clean, dry skin of the face and neck (avoiding the eye contour). Allow to dry for one to two minutes, then using a circular motion, gently massage skin until all of the gentle exfoliating particles have disappeared. Rinse thoroughly with water and apply an appropriate lotion for your skin type. May be used once or twice per week.
Ingredients: Aqua/water/eau, glycerin, hydrogenated polyisobutene, cetyl palmitate, bis-diglyceryl polyacyladipate-2, peg-6 stearate, isopropyl palmitate, peg-32 stearate, butylene glycol, echinacea angustifolia extract, malva sylvestris (mallow) flower extract, soluble collagen, stearyl alcohol, dimethicone, carbomer, disodium edta, sodium hydroxide, citric acid, sodium citrate, parfum/fragrance, phenoxyethanol, sorbic acid, sodium benzoate, alpha-isomethyl ionone, benzyl salicylate, benzyl benzoate, citronellol, linalool, amyl cinnamal, cinnamyl alcohol, eugenol, coumarin, limonene, isoeugenol, hydroxycitronellal, benzyl alcohol
Disclaimer: Please note that the ingredient list in the composition of Sisley and Hair Rituel by Sisley-Paris may change or vary over time. Please refer to the product packaging you receive before using for the most up-to-date ingredient list.
1.6 oz./ 50 mL
Online Inquiries: NMS21_C01CE
Store Inquiries: #401010463263
About Sisley-Paris:
When Hubert d’Ornano founded Sisley-Paris in 1976, his use of botanical active ingredients and essential oils in beauty products was an innovative concept. Today, Sisley continues its tradition of pioneering new treatments with research from its own laboratories. The French collection features a full range of skin care, makeup, and fragrances.
When Hubert d’Ornano founded Sisley-Paris in 1976, his use of botanical active ingredients and essential oils in beauty products was an innovative concept. Today, Sisley continues its tradition of pioneering new treatments with research from its own laboratories. The French collection features a full range of skin care, makeup, and fragrances.
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